Surface Microscopy, Spectroscopy & Fabrication
SURFACE MICROSCOPY, SPECTROSCOPY & FABRICATION FACILITY
The CHASE Surface Microscopy, Spectroscopy and Fabrication Facility, led by Dr. Carrie Donley, brings together equipment for thin film materials deposition, stabilization, surface area analysis, and profilometry. This Facility provides a class 1000 cleanroom essential for optimizing performance, reproducibility and reliability of hybrid photoelectrodes, and houses a standalone photoelectrode fabrication and characterization system that includes an array of optical tools under an inert atmosphere.
For materials characterization and additional fabrication tools, CHASE will partner with the Chapel Hill Analytical and Nanofabrication Laboratory (CHANL), a multi-department core user facility, which houses two Atomic Layer Deposition (ALD) chambers and atomic force and IR microscopy surface imaging tools. An environmental scanning electron microscopy (ESEM) and transmission electron microscopy (S/TEM) equipped with EDS detection are also available for routine use. A Kratos Supra x-ray photoelectron spectrometer (XPS) will support proposed CHASE experiments with a combination of XPS, UPS, and IPES in the same analysis chamber that provide detailed characterization of the core, valence, and conduction bands of the semiconducting interfaces generated within the scope of this research.